Precursor Materialien
Wir bieten Ihnen die folgenden Precursor zum Einsatz in der Halbleiter- & Photovoltaik-Industrie.
In der folgenden Liste sehen Sie die von uns angebotenen Precursor und dazugehörigen Datenblätter.
Eine Zusammenfassung unseres Produktangebotes finden Sie sich auch in den folgenden beiden Dokumenten zum Download.
Precursor Listing (419 KByte)
Precorsor Special (334 KByte)
Metals
CHORUS (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Ru |
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Anwendungen: | Metallization |
ChanTaL (CTBTa) (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Ta |
Anwendungen: | Metallization |
CYPRUS (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Ru |
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Anwendungen: | Metallization |
HyperW
Chem. Name / Formel: | confidential |
Hauptelement: | W |
PDMAT
Chem. Name / Formel: | Pentakis(dimethylamino)tantalum / Ta(NMe2)5 |
Hauptelement: | Ta |
Anwendungen: | Metallization |
RuEtCp2
Chem. Name / Formel: | Bis(ethylcyclopentadienyl)Ruthenium / Ru[(C2H5)C5H4)]2 |
Hauptelement: | Ru |
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Anwendungen: | Metallization |
TaCl5
Chem. Name / Formel: | Tantalum Pentachloride / TaCl5 |
Hauptelement: | Ta |
TaF5
Chem. Name / Formel: | Tantalum Pentafluoride / TaF5 |
Hauptelement: | Ta |
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Anwendungen: | Metallization |
TaPeDiS (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Ta |
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Informationen: | AL Tantalum Precursor solution for Ta and Ta alloys (TaW, TaC, TaSi) |
TBTDET
Chem. Name / Formel: | TertiaryButylimido,Tris(DiEthylamino)Tantalum / Ta[N(C2H5)2]3[=NC(CH3)3] |
Hauptelement: | Ta |
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Anwendungen: | Metallization ; high-k Ta2O5 |
TDEAT
Chem. Name / Formel: | Tetrakis(DiEthylAmino)Titanium / Ti[N(C2H5)2]4 |
Hauptelement: | Ti |
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Anwendungen: | Metallization ; high-k |
TDMAT
Chem. Name / Formel: | Tetrakis(DiMethylAmino)Titanium / Ti[N(CH3)2]4 |
Hauptelement: | Ti |
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Anwendungen: | Metallization |
TEMAT
Chem. Name / Formel: | Tetrakis(EthylMethylAmino)Titanium / Ti[N(C2H5)(CH3)]4 |
Hauptelement: | Ti |
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Anwendungen: | Metallization ; high-k |
TiCl4
Chem. Name / Formel: | Titanium Tetrachloride / TiCl4 |
Hauptelement: | Ti |
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Anwendungen: | Metallization |
ToRuS (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Ru |
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Anwendungen: | Metallization |
Informationen: | RuO4 based new Ru source. Air Liquide Ru Precursor for C-free, high adhesion Ru / RuO2 ALD, RuO2 CVD and other |
W(CO)6
Chem. Name / Formel: | Tungsten hexacarbonyl / W(CO)6 |
Hauptelement: | W |
Anwendungen: | Metallization |
High-k
Absolut Ba (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Ba |
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Anwendungen: | high-k |
Informationen: | Air Liquide Ba ALD solution. Low melting point and High vapour pressure Ba precursor |
Absolut Sr (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Sr |
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Anwendungen: | Super high-k |
Informationen: | Air Liquide Sr ALD solution. Low melting point and High vapour pressure Sr precursor |
HC3BO (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
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HfCl4
Chem. Name / Formel: | Tetrachloro hafnium / HfCl4 |
Hauptelement: | Hf |
Anwendungen: | high-k |
HTB
Chem. Name / Formel: | Hafnium Tertiary Butoxide / Hf[O-C(CH3)3]4 |
Hauptelement: | Hf |
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Anwendungen: | high-k |
Hyper Ba (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Ba |
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Anwendungen: | high-k |
Informationen: | Air Liquide High vapour pressure Ba precursor |
Hyper Sr (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Sr |
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Anwendungen: | Super high-k |
Informationen: | Air Liquide Sr ALD solution Air Liquide High vapour pressure Sr precursor |
PET: see TAETO (same product)
Chem. Name / Formel: | Pentaethoxy tantalum / Ta(OEt)5 |
Hauptelement: | Ta |
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Anwendungen: | high-k Ta2O5 |
Star-Ti (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Ti |
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Anwendungen: | high-k |
Informationen: | Air Liquide New Ti Precursor for High quality (B)STO films, ATO films, and conformal TiO2 films |
TAETO
Chem. Name / Formel: | Tantalum Pentaethoxide / Ta[O(C2H5)]5 |
Hauptelement: | Ta |
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TDEAA (Air Liquide Proprietary)
Chem. Name / Formel: | Tris(diethylamino)aluminium / Al(N(C2H5)2)3 |
Hauptelement: | Al |
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Anwendungen: | high-k Metallization |
TDEAHf
Chem. Name / Formel: | Tetrakis[DiEthylAmino]Hafnium / Hf[N(C2H5)2]4 |
Hauptelement: | Hf |
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Anwendungen: | high-k |
TDMAHf
Chem. Name / Formel: | Tetrakis[DiMethylAmino]Hafnium / Hf[N(CH3)2]4 |
Hauptelement: | Hf |
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Anwendungen: | high-k |
TEMAHf
Chem. Name / Formel: | Tetrakis[EthylMethylAmino]Hafnium / Hf[N(CH3)(C2H5)]4 |
Hauptelement: | Hf |
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Anwendungen: | high-k |
TEMASi
Chem. Name / Formel: | Tetrakis(EthylMethylAmino)Silane / Si[N(C2H5)(CH3)]4 |
Hauptelement: | Si |
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Anwendungen: | high-k |
TEMAT
Chem. Name / Formel: | Tetrakis(EthylMethylAmino)Titanium / Ti[N(C2H5)(CH3)]4 |
Hauptelement: | Ti |
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Anwendungen: | Metallization high-k |
TEMAZ
Chem. Name / Formel: | Tetrakis[EthylMethylAmino]Zirconium / Zr[N(CH3)(C2H5)]4 |
Hauptelement: | Zr |
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Anwendungen: | high-k |
TMA
Chem. Name / Formel: | TrimethylAluminium (dimer) / Al[CH3]3 |
Hauptelement: | Al |
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Anwendungen: | high-k |
Yttrium
Chem. Name / Formel: | Various Yttrium Cyclopentadienyls / Various |
Hauptelement: | Y |
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Anwendungen: | Super high-k |
Informationen: | Yttrium Compounds. Air Liquide Super High-k solution |
Z/HC3BO (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Zr/Hf |
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ZyALD (Air Liquide Proprietary)
Chem. Name / Formel: | Tris(dimethylamino)cyclopentadienylZirconium / (C5H5)Zr[N(CH3)2]3 |
Hauptelement: | Zr |
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Anwendungen: | high-k |
Catalysts & Solvents
EtOH
Chem. Name / Formel: | Ethanol / C2H5OH |
Hauptelement: | CnHn |
Hexane (solvent)
Chem. Name / Formel: | n-Hexane / C6H14 |
Hauptelement: | CnHn |
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Anwendungen: | Various |
Octane (solvent)
Chem. Name / Formel: | n-Octane / C8H18 |
Hauptelement: | CnHn |
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Anwendungen: | Various |
Pyridine (solvent)
Chem. Name / Formel: | PYRIDINE / C5H5N |
Hauptelement: | CnHn |
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Anwendungen: | Various |
Low-k
3MS
Chem. Name / Formel: | Trimethylsilane / SiH(CH3)3 |
Hauptelement: | Si |
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Anwendungen: | Low k CVD etch stop |
4MS
Chem. Name / Formel: | Tetramethylsilane / Si(CH3)4 |
Hauptelement: | Si |
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Anwendungen: | Low k CVD etch stop |
ALPS.3 (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Other |
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Anwendungen: | Various |
Informationen: | Air Liquide Porogen Solution for 32-22 nm technology node |
BCHD / NBD (Air Liquide Proprietary)
Chem. Name / Formel: | Bicyclo [2.2.1]-hepta-2,5-diene / 2,5-Norbornadiene / C7H8 |
Hauptelement: | C |
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Anwendungen: | Various |
BD3 (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Porogen |
DMDMOS
Chem. Name / Formel: | Dimethyldimethoxysilane / Si(Me)2(OMe)2 |
Hauptelement: | Si |
Anwendungen: | Low k CVD |
DMPS
Chem. Name / Formel: | Dimethylphenylsilane / (CH3)2SiH(C6H6), C8H12Si |
Hauptelement: | Si |
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Anwendungen: | Low k CVD |
HMDSO
Chem. Name / Formel: | Hexamethyldisiloxane / (CH3)3Si-O-Si(CH3)3 Si2OC6H18 |
Hauptelement: | Si |
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OMCTS
Chem. Name / Formel: | Octamethylcyclotetrasiloxane / ((CH3)2SiO-)4 |
Hauptelement: | Si |
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Anwendungen: | Low k CVD |
TMCTS
Chem. Name / Formel: | Tetramethylcyclotetrasiloxane / (CH3(H)SiO-)4 |
Hauptelement: | Si |
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Anwendungen: | Low k CVD SiO2 CVD |
TMDSO
Chem. Name / Formel: | 1,1,3,3-Tetramethyldisiloxane / (CH3)2HSi-O-SiH(CH3)2 |
Hauptelement: | Si |
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Silicone (Low-T-SiN)
3DMAS
Chem. Name / Formel: | Tris[dimethylamino]Silane / SiH[N(CH3)2]3 |
Hauptelement: | Si (SiO2) |
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Anwendungen: | high-k SiO2 ALD/CVD |
4DMAS
Chem. Name / Formel: | Tetrakis[dimethylamino]Silane / Si[N(CH3)2]4 |
Hauptelement: | Si (SiO2) |
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Anwendungen: | high-k |
AHEAD (Air Liquide Proprietary)
Chem. Name / Formel: | Hexakis(ethylamino)disilane / Si2(NHC2H5)6 |
Hauptelement: | Si (SiN) |
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Anwendungen: | SiN CVD SiO2 ALD/CVD |
AHEAD2 (Air Liquide Proprietary)
Chem. Name / Formel: | confidential |
Hauptelement: | Si (SiN) |
Anwendungen: | SiN CVD |
GeCl4
Chem. Name / Formel: | Germanium tetrachloride / GeCl4 |
Hauptelement: | Si |
HCDS
Chem. Name / Formel: | Hexachlorodisilane / Cl3Si-SiCl3 (Si2Cl6) |
Hauptelement: | Si (SiN) |
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Anwendungen: | Low T SiN SiO2 ALD/CVD |
SAM24 (Air Liquide Proprietary)
Chem. Name / Formel: | Silanediamine, N,N,N',N'-tetraethyl / (C8H22N2Si) |
Hauptelement: | Si |
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Anwendungen: | SiO2 ALD/CVD |
SiCl4
Chem. Name / Formel: | Tetrachlorosilane / SiCl4 |
Hauptelement: | Si |
TBOS
Chem. Name / Formel: | Tris(tert-Butoxy)Silanol / (C12H28O4Si) |
Hauptelement: | Si |
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Anwendungen: | SiO2 ALD/CVD |
TMOS
Chem. Name / Formel: | Tetramethoxysilane / Tetramethylorthosilicate / SiO4C4H12 (Si[OCH3]4) |
Hauptelement: | Si |
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Anwendungen: | SiO2 ALD/CVD |
TPOS
Chem. Name / Formel: | Tris(tert-Pentoxy)Silanol / (C15H34O4Si) |
Hauptelement: | Si |
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Anwendungen: | SiO2 ALD/CVD |
TSA (Air Liquide Proprietary)
Chem. Name / Formel: | Trisilylamine / (SiH3)N, Si3H9N |
Hauptelement: | Si (SiN/SiO2) |
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Anwendungen: | SiN CVD SiO2 ALD/CVD |
GST
DIPT
Chem. Name / Formel: | Diisopropyltelluride / Te[CH(CH3)2]2 |
Hauptelement: | Te |
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Anwendungen: | GST |
TDMAGe
Chem. Name / Formel: | Tetrakis(DiMethylAmino)Germanium / Ge[N(CH3)2]4 |
Hauptelement: | Ge |
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Anwendungen: | GST |
TDMASb
Chem. Name / Formel: | Tris(DiMethylAmino)Antimony / Sb[N(CH3)2]3 |
Hauptelement: | Sb |
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Anwendungen: | GST |
Photovoltaic & others
DEZ
Chem. Name / Formel: | Diethylzinc / (C2H5)2Zn |
Hauptelement: | Zn |
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Anwendungen: | Photovoltaic TCO |
POCl3
Chem. Name / Formel: | Phosphoryl trichloride / Phosphorus oxychloride / POCl3 |
Hauptelement: | P |
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Anwendungen: | Photovoltaic Dopant |
SnCl4
Chem. Name / Formel: | Tin Tetrachloride / Stannic Chloride / SnCl4 |
Hauptelement: | Sn |
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